摘要
Highly ordered through-hole anodic porous alumina film was fabricated using a facile single side and two-step anodization approach without any special pretreatment. The as-fabricated anodic aluminum oxide (AAO) film has a mean pore diameter of 80 nm and the interpore distance is ∼150 nm. The pore density can be high as 1.0 ×1010 cm-2. During the processes of removal of aluminum substrate and pore opening, a simple setup was used. The evolution of surface morphology of the AAO film was characterized by scanning electron microscopy (SEM). The fabricated pore-through AAO film can then be used as templates for growth of well aligned nanowire, nanotube and nanodevice.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 40-43 |
| 页数 | 4 |
| 期刊 | Materials Letters |
| 卷 | 59 |
| 期 | 1 |
| DOI | |
| 出版状态 | 已出版 - 1月 2005 |
| 已对外发布 | 是 |
学术指纹
探究 'A facile approach to formation of through-hole porous anodic aluminum oxide film' 的科研主题。它们共同构成独一无二的学术指纹。引用此
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver