原子层沉积技术选择性修饰Mo/HZSM-5对甲烷无氧芳构化反应的影响

Chang Sheng Chen; Bin Zhang; Yong Qin

doi:10.16606/j.cnki.issn0253-4320.2019.12.040

原子层沉积技术选择性修饰Mo/HZSM-5对甲烷无氧芳构化反应的影响

Chang Sheng Chen
, Bin Zhang
, Yong Qin

CAS - Institute of Coal Chemistry
University of Chinese Academy of Sciences

科研成果: 期刊稿件 › 文章 › 同行评审

1 引用（Scopus）

摘要

Atomic layer deposition (ALD) technique is used to deposit SiO₂ selectively onto the external surface of Mo/HZSM-5 to prepare a series of SiO₂-modified Mo/HZSM-5 catalysts.The performances of prepared Mo/HZSM-5 catalysts are evaluated through methane dehydroaromatizatioin.By means of XRD,NH₃-TPD,BET,XPS,TEM and other characterization measures,it is found that SiO₂ is mainly deposited on the external surface of the catalyst,and the content of strong acid in the catalyst decreases,thus improving the catalyst's performance in methane dehydroaromatizatioin.

投稿的翻译标题	Selective modification of Mo/HZSM-5 by atomic layer deposition and effects on methane dehydroaromatizatioin
源语言	繁体中文
页（从-至）	191-195
页数	5
期刊	Xiandai Huagong/Modern Chemical Industry
卷	39
期	12
DOI	https://doi.org/10.16606/j.cnki.issn0253-4320.2019.12.040
出版状态	已出版 - 20 12月 2019
已对外发布	是

关键词

Atomic layer deposition
Methane dehydroaromatization
SiO

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10.16606/j.cnki.issn0253-4320.2019.12.040

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title = "原子层沉积技术选择性修饰Mo/HZSM-5对甲烷无氧芳构化反应的影响",

abstract = "Atomic layer deposition (ALD) technique is used to deposit SiO2 selectively onto the external surface of Mo/HZSM-5 to prepare a series of SiO2-modified Mo/HZSM-5 catalysts.The performances of prepared Mo/HZSM-5 catalysts are evaluated through methane dehydroaromatizatioin.By means of XRD,NH3-TPD,BET,XPS,TEM and other characterization measures,it is found that SiO2 is mainly deposited on the external surface of the catalyst,and the content of strong acid in the catalyst decreases,thus improving the catalyst's performance in methane dehydroaromatizatioin.",

keywords = "Atomic layer deposition, Methane dehydroaromatization, SiO",

author = "Chen, \{Chang Sheng\} and Bin Zhang and Yong Qin",

year = "2019",

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AU - Chen, Chang Sheng

AU - Zhang, Bin

AU - Qin, Yong

PY - 2019/12/20

Y1 - 2019/12/20

N2 - Atomic layer deposition (ALD) technique is used to deposit SiO2 selectively onto the external surface of Mo/HZSM-5 to prepare a series of SiO2-modified Mo/HZSM-5 catalysts.The performances of prepared Mo/HZSM-5 catalysts are evaluated through methane dehydroaromatizatioin.By means of XRD,NH3-TPD,BET,XPS,TEM and other characterization measures,it is found that SiO2 is mainly deposited on the external surface of the catalyst,and the content of strong acid in the catalyst decreases,thus improving the catalyst's performance in methane dehydroaromatizatioin.

AB - Atomic layer deposition (ALD) technique is used to deposit SiO2 selectively onto the external surface of Mo/HZSM-5 to prepare a series of SiO2-modified Mo/HZSM-5 catalysts.The performances of prepared Mo/HZSM-5 catalysts are evaluated through methane dehydroaromatizatioin.By means of XRD,NH3-TPD,BET,XPS,TEM and other characterization measures,it is found that SiO2 is mainly deposited on the external surface of the catalyst,and the content of strong acid in the catalyst decreases,thus improving the catalyst's performance in methane dehydroaromatizatioin.

KW - Atomic layer deposition

KW - Methane dehydroaromatization

KW - SiO

UR - https://www.scopus.com/pages/publications/85077093270

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DO - 10.16606/j.cnki.issn0253-4320.2019.12.040

M3 - 文章

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SN - 0253-4320

VL - 39

SP - 191

EP - 195

JO - Xiandai Huagong/Modern Chemical Industry

JF - Xiandai Huagong/Modern Chemical Industry

IS - 12

ER -

原子层沉积技术选择性修饰Mo/HZSM-5对甲烷无氧芳构化反应的影响

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