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Ultrafast laser photoinscription of polarization sensitive devices in bulk silica glass

  • K. Mishchik
  • , G. Cheng
  • , C. Mauclair
  • , E. Audouard
  • , A. Boukenter
  • , Y. Ouerdane
  • , R. Stoian
  • Laboratoire Hubert Curien, UMR 5516 CNRS, Université de Lyon

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Laser-induced self-organization of nanopatterns in silica under ultrafast laser exposure is investigated using microscopy and spectroscopy methods. Taking advantage on the resulting anisotropic optical properties, efficient 3D polarization sensitive devices were fabricated.

Original languageEnglish
Title of host publicationBragg Gratings, Photosensitivity, and Poling in Glass Waveguides, BGPP 2010
PublisherOptical Society of America (OSA)
ISBN (Print)9781557528964
DOIs
StatePublished - 2010
Externally publishedYes
EventBragg Gratings, Photosensitivity, and Poling in Glass Waveguides, BGPP 2010 - Karlsruhe, Germany
Duration: 21 Jun 201024 Jun 2010

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Conference

ConferenceBragg Gratings, Photosensitivity, and Poling in Glass Waveguides, BGPP 2010
Country/TerritoryGermany
CityKarlsruhe
Period21/06/1024/06/10

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