Abstract
In order to increase the controllability of the deposition process of SiCN ceramics, SiCN ceramics were introduced into porous Si3N4 substrates by low pressure chemical vapor infiltration (LPCVI) using a simpler gaseous mixture of SiCl3CH3/NH3/H2 to substitute the gaseous mixture of SiCl4/C3H6/NH3/H2. The as-prepared SiCN ceramics attained the microstructure of nano-sized graphite crystals distributing in amorphous SiCN phase. The SiCN ceramics with this unique microstructure had suitable relative complex permittivity, leading to excellent electromagnetic (EM) wave absorbing performance. The minimum reflection coefficient of SiCN–Si3N4 ceramics was −40 dB (>99.99% absorption) at 11.1 GHz with the thickness of 3 mm. When the thickness was 3.25 mm, reflection coefficient of SiCN–Si3N4 ceramics was lower than −10 dB (>90% absorption) at the whole X-band.
Original language | English |
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Pages (from-to) | 11372-11378 |
Number of pages | 7 |
Journal | Ceramics International |
Volume | 41 |
Issue number | 9 |
DOIs | |
State | Published - Nov 2015 |
Keywords
- C. Dielectric properties
- Chemical vapor infiltration
- EM wave absorption
- SiCN ceramics