Abstract
WSi2 layer was introduced at MoSi2/Nb-Ti-Si based alloy interface to suppress the elemental diffusion. During coating formation process, inward diffusion of [Si] could be retarded and the growth rate of inner NbSi2 layer was slowed down consequently. At 1250 °C, the MoSi2/WSi2 compound coating showed superior oxidation resistance relative to MoSi2/NbSi2 compound coating in terms of thinner scale and less MoSi2 consumption. Parabolic rate constants of scales grew on these two coatings are 0.929 μm2 h−1 and 4.782 μm2 h-1, respectively. The improvement was resulted from the WSi2 layer, which acted as both a diffusion barrier and Si reservoir simultaneously.
| Original language | English |
|---|---|
| Article number | 108299 |
| Journal | Corrosion Science |
| Volume | 163 |
| DOIs | |
| State | Published - Feb 2020 |
Keywords
- A. Intermetallics
- B. SEM
- C. High temperature corrosion
- C. Oxidation
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