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Study on the diffusion barrier effect of WSi2 layer at the MoSi2/Nb-Ti-Si based alloy interface

  • Northwestern Polytechnical University Xian

Research output: Contribution to journalArticlepeer-review

37 Scopus citations

Abstract

WSi2 layer was introduced at MoSi2/Nb-Ti-Si based alloy interface to suppress the elemental diffusion. During coating formation process, inward diffusion of [Si] could be retarded and the growth rate of inner NbSi2 layer was slowed down consequently. At 1250 °C, the MoSi2/WSi2 compound coating showed superior oxidation resistance relative to MoSi2/NbSi2 compound coating in terms of thinner scale and less MoSi2 consumption. Parabolic rate constants of scales grew on these two coatings are 0.929 μm2 h−1 and 4.782 μm2 h-1, respectively. The improvement was resulted from the WSi2 layer, which acted as both a diffusion barrier and Si reservoir simultaneously.

Original languageEnglish
Article number108299
JournalCorrosion Science
Volume163
DOIs
StatePublished - Feb 2020

Keywords

  • A. Intermetallics
  • B. SEM
  • C. High temperature corrosion
  • C. Oxidation

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