Abstract
The fabrication and the performance of PMMA resistive switching device have been studied by using FR-4 (copper), PMMA (poly methyl methacrylate) and aluminum as the active anode, the solid electrolyte and the inert cathode respectively. By etching the copper surface with the acid solution [4HNO3 + 11H3PO4 (98 %) + 5CH3COOH] at 60 °C for 2 min, a good performance of Cu/PMMA/Al device, which can switch until 2300 cycles, has been realized. The spin rate for forming the PMMA coating plays a decisive role in the performance of Cu/PMMA/Al device. The best performance of the Cu/PMMA/Al device was obtained only when the spin rate of deposition of PMMA reached 4000 rpm (low thickness).
| Original language | English |
|---|---|
| Pages (from-to) | 1719-1725 |
| Number of pages | 7 |
| Journal | Microsystem Technologies |
| Volume | 23 |
| Issue number | 6 |
| DOIs | |
| State | Published - 1 Jun 2017 |
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