Abstract
This work explores how annealing influences the properties of ultrathin amorphous zinc tin oxide (38 nm thick a-ZTO) thin films fabricated by magnetron sputtering. The samples were subjected to post-deposition annealing at temperatures between 200 °C and 300 °C in an oxidizing environment, consisting of an O2/N2 gas mixture. During the annealing process, the sheet resistance of the films was continuously monitored using in situ measurements. In-situ monitoring reveals a transition from semiconducting to metallic-like transport as the resistivity reaches its minimum. Optimized annealing yields films with conductivity up to 430Scm−1, carrier concentration 1.5×1020cm−3, and mobility 19cm2V−1s−1, without compromising optical properties. Complementary density functional theory (DFT) calculations suggest that the formation of oxygen-related species such as peroxo (O22−) and ozonide (O3−) groups play a role in modifying the electronic structure and contributing to carrier transport, while the dominant effect arises from defect reorganization and mobility enhancement.
| Original language | English |
|---|---|
| Article number | 100825 |
| Journal | Materials Today Advances |
| Volume | 30 |
| DOIs | |
| State | Published - Jun 2026 |
Keywords
- Amorphous transparent conducting oxide (a-TCO)
- Conduction mechanism
- In-situ annealing
- Oxidizing atmosphere
- Peroxo and Ozonide species
- Ultrathin a-ZTO
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