Research status in preparation of Iridium anti-oxidation coatings by MOCVD

The basic theory and characteristics of MOCVD technology of fabricating Ir coating were summarized. Factors affecting the MOCVD deposition process of Ir coating were introduced, including metal organic precursor, the type of substrate, deposition temperature and atmosphere. Three failure mechanism of Ir coating including coefficient of thermal expansion mismatch, impurities and micro-cracks were summarized and evaluated. Finally, the fabrication of Ir coating by MOCVD at home and abroad were compared and the expensive, imperfect theory and poor bonding problem at home was pointed out while the possible route was put forward.