Abstract
Electrochemical deposition self-assembly method was used to fabricate a metamaterial absorber with nanoscale silver dendritic pattern unit. The metamaterial absorber is consisted of "unit-dielectric-metal" structure, which contains randomly distributed silver dendritic pattern units with diameters of 70-140 nm, PVA dielectric interlayer and nanoscale silver metal plane. By means of changing the deposition conditions, such as deposition voltage and concentration of PEG, the absorption peak quantity and absorption magnitude of the metamaterial absorber can be modulated. The experiment result shows that the absorber can realize multi-frequency absorption at 538 and 656 nm with the magnitude of 21.1% and 24.8%. The fabrication of this large structure area metamaterial absorber has the advantages of easy processing and low cost.
Original language | English |
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Pages (from-to) | 884-887 |
Number of pages | 4 |
Journal | Gongneng Cailiao/Journal of Functional Materials |
Volume | 43 |
Issue number | 7 |
State | Published - 15 Apr 2012 |
Keywords
- Absorber
- Electrochemical deposition
- Metamaterials
- Visible light