Properties of TiN/TiCN multilayer films by direct current magnetron sputtering

Jianyun Zheng, Junying Hao, Xiaoqiang Liu, Weimin Liu

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33 Scopus citations

Abstract

In this work, a TiN/TiCN multilayer film was deposited by direct current magnetron sputtering. Its thickness was about 9675nm and the bilayer numbers were 10. The composition, crystalline structure and amorphous carbon (a-C) phase of the film were investigated by x-ray photoelectron spectroscopy, x-ray diffraction and Raman spectroscopy. Field emission scanning electron microscopy was employed to observe the inner structure of the film. The TiCN layer exhibited a glass-like structure and the TiN layer presented a columnar structure. The adhesion force between the film and the substrate was 37.8N determined by scratch tests. The hardness of the uppermost TiCN layer and the total film was 34.22GPa and 27.22GPa obtained by nano-indentation tests, respectively. In addition, the TiN/TiCN multilayer thick film showed different types of tribological behaviour against Si 3N 4 balls and steel balls. The mean coefficient of friction and the wear rate of the film were about 0.14 and 1.15×10 -6mm 3N -1m -1 when the film slid against Si 3N 4 balls for 1h.

Original languageEnglish
Article number095303
JournalJournal of Physics D: Applied Physics
Volume45
Issue number9
DOIs
StatePublished - 7 Mar 2012
Externally publishedYes

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