Abstract
Boron doped carbon (BCx) thin film was prepared at 1100°C on carbon fiber substrate by low pressure chemical vapor deposition (LPCVD) from BCl3 and C3H6 as boron and carbon sources respectively. Scanning electron microscopy observation results show that the BCx coating has a smooth surface and the cross section of BCx coating exhibits a very finely laminated structure. X-ray diffraction analysis results show that the BCx coating consists of B4C and pyrolytic carbon with a high degree of graphitization. X-ray photoelectron spectroscopy results show that there is 15% (in mole, the same below) boron induced in the BCx coating. Five different chemical surroundings of boron atoms were confirmed in the BCx coating, namely, B4C, boron atoms substituted in the graphite-like structures, and mixtures of B-C bonding and B-O bonding referred to as BC2O and BCO2, B2O3, respectively. More than 40% of boron atoms are included by substitution in the graphitic-like structure.
| Original language | English |
|---|---|
| Pages (from-to) | 541-545 |
| Number of pages | 5 |
| Journal | Kuei Suan Jen Hsueh Pao/Journal of the Chinese Ceramic Society |
| Volume | 35 |
| Issue number | 5 |
| State | Published - May 2007 |
Keywords
- Boron doped carbon thin film
- Laminated structure
- Low pressure chemical vapor deposition
- X-ray diffraction
- X-ray photoelectron spectroscopy