Skip to main navigation Skip to search Skip to main content

Point defects in CdTe

  • Northwestern Polytechnical University Xian
  • Peking University
  • Yantai University

Research output: Contribution to journalArticlepeer-review

23 Scopus citations

Abstract

A point defect model for CdTe is presented based on a selection of potentially electrically active point defects which includes VCd, Cdi, VTe, Tei and TeCd. The reaction energies and entropies of the defects were established. The effect of changing the Fermi energy with Cd partial pressure and temperature are then discussed in detail. The defect concentrations are given as functions of Cd partial pressure and the minimum attainable deviation in stoichiometry is derived. Through the analysis and the calculations, a specific detailed recipe for post-growth annealing is suggested.

Original languageEnglish
Pages (from-to)266-275
Number of pages10
JournalJournal of Crystal Growth
Volume256
Issue number3-4
DOIs
StatePublished - Sep 2003

Keywords

  • A1. Annealing
  • A1. Cd Partial pressure
  • A1. Defect concentrations
  • A1. Point defects
  • A1. Quasichemical equilibrium
  • B1. CdTe

Fingerprint

Dive into the research topics of 'Point defects in CdTe'. Together they form a unique fingerprint.

Cite this