Abstract
The growth of Ag clusters on Si (111) -7×7 surfaces was studied by scanning tunneling microscopy (STM), ultraviolet photoelectron spectroscopy, and x-ray photoelectron spectroscopy (XPS). A shift in the Ag 3d binding energy and a noticeable change in the valence-band structure reveal a significant modification of the electronic states of the Si (111) -7×7 surface and the dispersed Ag clusters, which had a strong dependence on the coverage of Ag. Furthermore, these Ag clusters deposited on the Si surface alter the behavior of oxygen adsorption on the Si (111) -7×7 surface. As evidenced by XPS, the presence of Ag inhibits the adsorbed surface oxygen species, the ins-ins and ad-ins oxygen, in which "ad" denotes an O atom bonding on top of the Si adatom and "ins" denotes an O atom inserted into a Si adatom back bond. The STM and high-resolution electron energy loss spectroscopy results show that the ins-ins oxygen species are more significantly suppressed by the Ag clusters compared to the ad-ins oxygen.
| Original language | English |
|---|---|
| Pages (from-to) | 62-67 |
| Number of pages | 6 |
| Journal | Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films |
| Volume | 26 |
| Issue number | 1 |
| DOIs | |
| State | Published - 2008 |
| Externally published | Yes |
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