Oxidation resistance and diffusion behavior of MoSi2/WSi2/(Nb,X)Si2 compound coating at 1400 °C

Gao Yue; Xiping Guo; Yanqiang Qiao

doi:10.1016/j.jallcom.2021.159498

Oxidation resistance and diffusion behavior of MoSi₂/WSi₂/(Nb,X)Si₂ compound coating at 1400 °C

Gao Yue, Xiping Guo, Yanqiang Qiao

School of Materials Sience and Engineering

Northwestern Polytechnical University Xian

Research output: Contribution to journal › Article › peer-review

11 Scopus citations

Abstract

MoSi₂/WSi₂/(Nb,X)Si₂ compound coating showed outstanding oxidation resistance at 1400 °C. After oxidation for 100 h, the specimen kept good integrality and the parabolic rate constant of the scale growth was about 1.497 µm² h⁻¹. NbSi₂ layer could improve the bonding of MoSi₂/WSi₂ layers to the substrate, postpone their degradation into porous sub-silicide layer and provide adequate Si for oxidation. The intense interdiffusion between MoSi₂ and WSi₂ layers would result in formation of pores in WSi₂ layer and then weaken its barrier effect. In addition, a small amount of alloying elements Ti, Cr and Al from the substrate could diffuse through the MoSi₂/WSi₂ layers along the grain boundaries during oxidation. As a result, there are TiO₂ formed in the scale. After oxidation for 100 h, a gradient compound layer of (Mo,W)Si₂/(W,X)Si₂/(Ti,Nb)₅Si₄ formed eventually.

Original language	English
Article number	159498
Journal	Journal of Alloys and Compounds
Volume	870
DOIs	https://doi.org/10.1016/j.jallcom.2021.159498
State	Published - 25 Jul 2021

Keywords

Compound coating
MoSi layer
Oxidation behavior
Si revisor
WSi layer

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title = "Oxidation resistance and diffusion behavior of MoSi2/WSi2/(Nb,X)Si2 compound coating at 1400 °C",

abstract = "MoSi2/WSi2/(Nb,X)Si2 compound coating showed outstanding oxidation resistance at 1400 °C. After oxidation for 100 h, the specimen kept good integrality and the parabolic rate constant of the scale growth was about 1.497 µm2 h−1. NbSi2 layer could improve the bonding of MoSi2/WSi2 layers to the substrate, postpone their degradation into porous sub-silicide layer and provide adequate Si for oxidation. The intense interdiffusion between MoSi2 and WSi2 layers would result in formation of pores in WSi2 layer and then weaken its barrier effect. In addition, a small amount of alloying elements Ti, Cr and Al from the substrate could diffuse through the MoSi2/WSi2 layers along the grain boundaries during oxidation. As a result, there are TiO2 formed in the scale. After oxidation for 100 h, a gradient compound layer of (Mo,W)Si2/(W,X)Si2/(Ti,Nb)5Si4 formed eventually.",

keywords = "Compound coating, MoSi layer, Oxidation behavior, Si revisor, WSi layer",

author = "Gao Yue and Xiping Guo and Yanqiang Qiao",

note = "Publisher Copyright: {\textcopyright} 2021 Elsevier B.V.",

year = "2021",

month = jul,

day = "25",

doi = "10.1016/j.jallcom.2021.159498",

language = "英语",

volume = "870",

journal = "Journal of Alloys and Compounds",

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TY - JOUR

T1 - Oxidation resistance and diffusion behavior of MoSi2/WSi2/(Nb,X)Si2 compound coating at 1400 °C

AU - Yue, Gao

AU - Guo, Xiping

AU - Qiao, Yanqiang

PY - 2021/7/25

Y1 - 2021/7/25

N2 - MoSi2/WSi2/(Nb,X)Si2 compound coating showed outstanding oxidation resistance at 1400 °C. After oxidation for 100 h, the specimen kept good integrality and the parabolic rate constant of the scale growth was about 1.497 µm2 h−1. NbSi2 layer could improve the bonding of MoSi2/WSi2 layers to the substrate, postpone their degradation into porous sub-silicide layer and provide adequate Si for oxidation. The intense interdiffusion between MoSi2 and WSi2 layers would result in formation of pores in WSi2 layer and then weaken its barrier effect. In addition, a small amount of alloying elements Ti, Cr and Al from the substrate could diffuse through the MoSi2/WSi2 layers along the grain boundaries during oxidation. As a result, there are TiO2 formed in the scale. After oxidation for 100 h, a gradient compound layer of (Mo,W)Si2/(W,X)Si2/(Ti,Nb)5Si4 formed eventually.

AB - MoSi2/WSi2/(Nb,X)Si2 compound coating showed outstanding oxidation resistance at 1400 °C. After oxidation for 100 h, the specimen kept good integrality and the parabolic rate constant of the scale growth was about 1.497 µm2 h−1. NbSi2 layer could improve the bonding of MoSi2/WSi2 layers to the substrate, postpone their degradation into porous sub-silicide layer and provide adequate Si for oxidation. The intense interdiffusion between MoSi2 and WSi2 layers would result in formation of pores in WSi2 layer and then weaken its barrier effect. In addition, a small amount of alloying elements Ti, Cr and Al from the substrate could diffuse through the MoSi2/WSi2 layers along the grain boundaries during oxidation. As a result, there are TiO2 formed in the scale. After oxidation for 100 h, a gradient compound layer of (Mo,W)Si2/(W,X)Si2/(Ti,Nb)5Si4 formed eventually.

KW - Compound coating

KW - MoSi layer

KW - Oxidation behavior

KW - Si revisor

KW - WSi layer

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DO - 10.1016/j.jallcom.2021.159498

M3 - 文章

AN - SCOPUS:85102639206

SN - 0925-8388

VL - 870

JO - Journal of Alloys and Compounds

JF - Journal of Alloys and Compounds

M1 - 159498

ER -

Oxidation resistance and diffusion behavior of MoSi₂/WSi₂/(Nb,X)Si₂ compound coating at 1400 °C

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Keywords

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