Multiply steady states and nonequilibrium phase transition in chemical vapor deposition process

Gui Shen Yan, He Jun Li, Zhi Biao Hao

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

This paper is mainly concerned with the mechanism to produce multi - states and nonequilibrum phase transition in chemical vapor deposition (CVD) process. It was discovered that the polymerization reaction in CVD process is a typical nonequilibrum c chemical reaction with a bifurcation structure and its steady state model of free radical is fit to the Schlogl model through carefully analyzing the mechanism and experimental results. There are linear and nonlinear areas in the nonequilibrum reaction system, and there is a nonequilibrum phase transition between the two areas. The CVD product in the linear area is different from that in t the nonlinear area The product in the linear area ios pyrocarbon and that in the nonlinear area is the carbon black. Further study reveals that the function of deposition rate is linear and has only one formula when the CVD reaction system is in the linear area. But the function of depostion rate will be nonlinear, has multi-solutions and generates a bifurcation structure when the system goes into the nonlinear area. With the reation condition being far from the equilibrium, the CVD reaction system will select the steady state branch that is far from equilibrium.

Original languageEnglish
Pages (from-to)330-331
Number of pages2
JournalWuli Xuebao/Acta Physica Sinica
Volume51
Issue number2
StatePublished - Feb 2002

Keywords

  • CVD reaction
  • Nonequilibrium chemical reaction
  • Nonequilibrium phase transition
  • Pyrocarbon
  • Schlogl model

Fingerprint

Dive into the research topics of 'Multiply steady states and nonequilibrium phase transition in chemical vapor deposition process'. Together they form a unique fingerprint.

Cite this