Abstract
Vacuum diffusion bonding of Ti2AlNb and GH4169, by inserting metal foils of Ni+Nb as interlayer, was studied experimentally under the conditions of bonding temperature 950-1100°C, axial pressure 20 MPa and holding time 20-120 min. The joints microstructures and bonding mechanism were studied by SEM and EDS analyses. The results show that Ti2AlNb and GH4169 could be well bonded with metal foils of Ni+Nb as interlayer. There were six reacted layers between Ti2AlNb and GH4169, and the layers were Fe-Ni-Cr solid solution, Ni3Nb, Ni6Nb7, residual Nb, Ti-Nb solid solution, O phase with high Nb, orderly, from the GH4169. When sheared, the joint fractured in the Ni6Nb7 layer which between the Ni3Nb layer and the residual Nb layer. The maximum shear strength was 460.3 MPa at 1050°C, 20 MPa, 40 min.
| Original language | English |
|---|---|
| Pages (from-to) | 57-62 |
| Number of pages | 6 |
| Journal | Hangkong Cailiao Xuebao/Journal of Aeronautical Materials |
| Volume | 29 |
| Issue number | 1 |
| State | Published - Feb 2009 |
Keywords
- GH4169
- Nb+Ni interlayer
- TiAlNb
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