Skip to main navigation Skip to search Skip to main content

Microstructure and properties of nc-TiC/a-C:H films deposited by radio frequency reactive sputtering

  • CAS - Lanzhou Institute of Chemical Physics
  • University of Chinese Academy of Sciences

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

Amorphous carbon films containing titanium carbide (nc-TiC/a-C:H) were deposited onto n-type silicon (100) by radio frequency reactive sputtering titanium target in an Ar-CH4 mixed atmosphere. The composition and microstructure of the films were characterised by means of X-ray photoelectron spectroscopy, field emitted SEM, XRD and Raman spectra. The mechanical and tribological properties of the films were measured by a nanoindentation tester and a ball-ondisc UMT-2MT tribometer. By adjusting the CH4 flowrate, Ti content in the films could be controlled, and a transition in structures of the films from loose polymer-like to glassy and dense nanostructure was observed. The density of coatings was improved by the introduction of TiC nanocrystalline particles. The mechanical and lubricious properties were different accordingly.

Original languageEnglish
Pages (from-to)1669-1673
Number of pages5
JournalMaterials Science and Technology
Volume27
Issue number11
DOIs
StatePublished - Nov 2011
Externally publishedYes

Keywords

  • Amorphous carbon films
  • Lubrication
  • Nanostructure
  • Radio frequency sputtering
  • Titanium carbide

Fingerprint

Dive into the research topics of 'Microstructure and properties of nc-TiC/a-C:H films deposited by radio frequency reactive sputtering'. Together they form a unique fingerprint.

Cite this