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Growth-stage Zn doping reduces Schottky barriers and enhances the optoelectronic performance of 2D InSe

  • Dan Zheng
  • , Yi Liu
  • , Haiwen Yu
  • , Kejing Liu
  • , Zhengyi Sun
  • , Jian Li
  • , Baoqiang Zhang
  • , Shuyu Chen
  • , Ning Han
  • , He Huang
  • , Yerzhan Mukhametkarimov
  • , Qinghua Zhao
  • , Tao Wang
  • Northwestern Polytechnical University Xian
  • Ministry of Industry and Information Technology
  • Imdetek Corp. Ltd
  • Ltd.
  • Shaanxi Science and Technology Press
  • Farabi University

Research output: Contribution to journalArticlepeer-review

Abstract

Two-dimensional (2D) semiconductors are attractive for next-generation “More-than-Moore” electronics. However, their performance is often constrained by intrinsic defects that limit carrier transport and recombination. Here, we report centimeter-sized Zn-doped InSe crystals grown by the vertical Bridgman method and demonstrate high-performance InSe photodetectors enabled by growth-stage defect engineering. It was found that Zn incorporation preserves the layered InSe structure while inducing slight lattice expansion along the c axis. Photoluminescence (PL), X-ray photoelectron spectroscopy (XPS), and Hall measurements reveal defect-state reconstruction and partial compensation of native donor-like defects, leading to reduced carrier concentration and weaker defect scattering. Consequently, Zn-doped InSe devices achieve a high on/off ratio of ∼105 and a mobility of 0.468 cm2 V−1 s−1, along with a remarkable photoresponsivity of ∼438 A W−1. Scanning photocurrent microscopy (SPCM) and temperature-dependent transport measurements further show that Zn doping lowers the Schottky barrier height by weakening Fermi-level pinning at the metal–semiconductor interface. These results establish Zn doping as an effective strategy for coordinating defect regulation, carrier transport, and contact engineering in InSe, and provide a practical route towards high-performance 2D optoelectronic devices.

Original languageEnglish
JournalJournal of Materials Chemistry C
DOIs
StateAccepted/In press - 2026

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