Abstract
Hg3-3xIn2xTe3(MIT)(x=0.5) single crystals were successfully grown using the vertical Bridgman method (VB) and were investigated by XRD, RO-XRD, and Hall measurements. The results show that the as-grown crystal is high quality single-phase crystal. The wafer surface is (311) face, and the crystal face is located at θ=23.86°. The spatial deviation angle of the (311) face is φ=2.9°, and the degree of orientation scatter is FWHM=0.3°. The crystal is an n-type semiconductor. The resistivity, carrier concentration, and carrier mobility are 4.79 × 102Ω·cm, 2.83 × 1013 cm-3, and 4.6 × 102 cm2/(V·s), respectively. The Fermi level lies near the midgap and is about 8 meV higher. The, calculated values of the carrier concentration are in agreement with the experimental ones.
| Original language | English |
|---|---|
| Pages (from-to) | 1069-1071 |
| Number of pages | 3 |
| Journal | Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors |
| Volume | 28 |
| Issue number | 7 |
| State | Published - Jul 2007 |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
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SDG 7 Affordable and Clean Energy
Keywords
- Crystal growth
- HgInTe
- NIR detector
- Photovoltaic semiconductors
- Vertical Bridgman method
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