Formation mechanism of robust silver nanoparticle film with superhydrophobicity

Zhiguang Guo; Weimin Liu

doi:10.1063/1.3525574

Formation mechanism of robust silver nanoparticle film with superhydrophobicity

Zhiguang Guo
, Weimin Liu

Research output: Contribution to journal › Article › peer-review

13 Scopus citations

Abstract

The promising formation mechanism of Ag nanoparticles on a Si wafer displaying superhydrophobicity, generated by means of a facile in situ galvanic cell route, is discussed. The results showed that the promising formation of Ag nanoparticles is based on a microelectrochemical redox reaction in which both the anodic process and the cathodic process occur simultaneously on the silicon substrate surface. This discovery could be of great importance in the design of other metal/semiconductor systems.

Original language	English
Article number	243701
Journal	Applied Physics Letters
Volume	97
Issue number	24
DOIs	https://doi.org/10.1063/1.3525574
State	Published - 13 Dec 2010
Externally published	Yes

Access to Document

10.1063/1.3525574

Cite this

@article{ad6f5dfd3968444fbb8a92c8b271c698,

title = "Formation mechanism of robust silver nanoparticle film with superhydrophobicity",

abstract = "The promising formation mechanism of Ag nanoparticles on a Si wafer displaying superhydrophobicity, generated by means of a facile in situ galvanic cell route, is discussed. The results showed that the promising formation of Ag nanoparticles is based on a microelectrochemical redox reaction in which both the anodic process and the cathodic process occur simultaneously on the silicon substrate surface. This discovery could be of great importance in the design of other metal/semiconductor systems.",

author = "Zhiguang Guo and Weimin Liu",

year = "2010",

month = dec,

day = "13",

doi = "10.1063/1.3525574",

language = "英语",

volume = "97",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "24",

}

TY - JOUR

T1 - Formation mechanism of robust silver nanoparticle film with superhydrophobicity

AU - Guo, Zhiguang

AU - Liu, Weimin

PY - 2010/12/13

Y1 - 2010/12/13

N2 - The promising formation mechanism of Ag nanoparticles on a Si wafer displaying superhydrophobicity, generated by means of a facile in situ galvanic cell route, is discussed. The results showed that the promising formation of Ag nanoparticles is based on a microelectrochemical redox reaction in which both the anodic process and the cathodic process occur simultaneously on the silicon substrate surface. This discovery could be of great importance in the design of other metal/semiconductor systems.

AB - The promising formation mechanism of Ag nanoparticles on a Si wafer displaying superhydrophobicity, generated by means of a facile in situ galvanic cell route, is discussed. The results showed that the promising formation of Ag nanoparticles is based on a microelectrochemical redox reaction in which both the anodic process and the cathodic process occur simultaneously on the silicon substrate surface. This discovery could be of great importance in the design of other metal/semiconductor systems.

UR - https://www.scopus.com/pages/publications/78650385709

U2 - 10.1063/1.3525574

DO - 10.1063/1.3525574

M3 - 文章

AN - SCOPUS:78650385709

SN - 0003-6951

VL - 97

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 24

M1 - 243701

ER -

Formation mechanism of robust silver nanoparticle film with superhydrophobicity

Abstract

Access to Document

Other files and links

Fingerprint

Cite this