Fabrication of zao ceramic target and effect on the photoelectric properties of its film

Meikang Han; Jueming Yang; Xiaowei Yin; Jianping Li

doi:10.1002/9781118932995.ch16

Fabrication of zao ceramic target and effect on the photoelectric properties of its film

Meikang Han, Jueming Yang, Xiaowei Yin, Jianping Li

School of Materials Sience and Engineering

Xi'an Technological University

Research output: Chapter in Book/Report/Conference proceeding › Chapter › peer-review

Abstract

ZAO ceramic target was fabricated by cold isotatic pressing and pressureless sintering ZAO powder used method of homogeneous precipitation. Then, ZAO film was deposited by RF magnetron sputtering of the lab-made ZAO target. The microstructures and phases of ZAO target and its film were characterized by scanning electron microscopy (SEM), energy dispersion spectroscopy (EDS), and X-ray diffraction apparatus. Results show that the relative density of the target is above 93%, and there are the second phase ZnAl₂O₄ in ZnO crystal boundary. ZAO films with resistivity 1.083xl0^-3 cm and visible light transmittance beyond 85% were obtained by the target.

Original language	English
Title of host publication	High Temperature Ceramic Matrix Composites 8
Publisher	wiley
Pages	159-166
Number of pages	8
ISBN (Electronic)	9781118932995
ISBN (Print)	9781118932988
DOIs	https://doi.org/10.1002/9781118932995.ch16
State	Published - 1 Jan 2014

Keywords

Cold isotatic pressing
Pressureless sintering
Scanning electron microscopy
Transparent conductive oxide
X-ray diffraction

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10.1002/9781118932995.ch16

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title = "Fabrication of zao ceramic target and effect on the photoelectric properties of its film",

abstract = "ZAO ceramic target was fabricated by cold isotatic pressing and pressureless sintering ZAO powder used method of homogeneous precipitation. Then, ZAO film was deposited by RF magnetron sputtering of the lab-made ZAO target. The microstructures and phases of ZAO target and its film were characterized by scanning electron microscopy (SEM), energy dispersion spectroscopy (EDS), and X-ray diffraction apparatus. Results show that the relative density of the target is above 93%, and there are the second phase ZnAl2O4 in ZnO crystal boundary. ZAO films with resistivity 1.083xl0-3 cm and visible light transmittance beyond 85% were obtained by the target.",

keywords = "Cold isotatic pressing, Pressureless sintering, Scanning electron microscopy, Transparent conductive oxide, X-ray diffraction",

author = "Meikang Han and Jueming Yang and Xiaowei Yin and Jianping Li",

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doi = "10.1002/9781118932995.ch16",

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T1 - Fabrication of zao ceramic target and effect on the photoelectric properties of its film

AU - Han, Meikang

AU - Yang, Jueming

AU - Yin, Xiaowei

AU - Li, Jianping

PY - 2014/1/1

Y1 - 2014/1/1

N2 - ZAO ceramic target was fabricated by cold isotatic pressing and pressureless sintering ZAO powder used method of homogeneous precipitation. Then, ZAO film was deposited by RF magnetron sputtering of the lab-made ZAO target. The microstructures and phases of ZAO target and its film were characterized by scanning electron microscopy (SEM), energy dispersion spectroscopy (EDS), and X-ray diffraction apparatus. Results show that the relative density of the target is above 93%, and there are the second phase ZnAl2O4 in ZnO crystal boundary. ZAO films with resistivity 1.083xl0-3 cm and visible light transmittance beyond 85% were obtained by the target.

AB - ZAO ceramic target was fabricated by cold isotatic pressing and pressureless sintering ZAO powder used method of homogeneous precipitation. Then, ZAO film was deposited by RF magnetron sputtering of the lab-made ZAO target. The microstructures and phases of ZAO target and its film were characterized by scanning electron microscopy (SEM), energy dispersion spectroscopy (EDS), and X-ray diffraction apparatus. Results show that the relative density of the target is above 93%, and there are the second phase ZnAl2O4 in ZnO crystal boundary. ZAO films with resistivity 1.083xl0-3 cm and visible light transmittance beyond 85% were obtained by the target.

KW - Cold isotatic pressing

KW - Pressureless sintering

KW - Scanning electron microscopy

KW - Transparent conductive oxide

KW - X-ray diffraction

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DO - 10.1002/9781118932995.ch16

M3 - 章节

AN - SCOPUS:85101890694

SN - 9781118932988

SP - 159

EP - 166

BT - High Temperature Ceramic Matrix Composites 8

PB - wiley

ER -

Fabrication of zao ceramic target and effect on the photoelectric properties of its film

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Keywords

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