Abstract
The fabrication of positively patterned conducting polymer microstructures was discussed. The conducting polymer structures were fabricated by one-step electropolymerization. The atomic force microscopic (AFM) measurement of the octadecyltrichlorosilane patterned silicon substrate using stamp showed the light replication of the poly(dimethylsiloxane) stamp.
| Original language | English |
|---|---|
| Pages (from-to) | 1367-1370 |
| Number of pages | 4 |
| Journal | Advanced Materials |
| Volume | 15 |
| Issue number | 16 |
| DOIs | |
| State | Published - 15 Aug 2003 |
| Externally published | Yes |