Fabrication of micro hole array on the surface of CVD ZnS by scanning ultrafast pulse laser for antireflection

Chemical vapor deposited (CVD) ZnS is a promising long-wave infrared (8–12 μm) window material. Yet antireflection is necessary since Fresnel reflection from its surface is high due to the high refractive index of ZnS. Sub-wavelength structured surface of micro hole array was fabricated on CVD ZnS by scanning ultrafast pulse laser ablation. The effects of beam profile, pulse width and beam power on the radius and morphology of the holes were studied. Gaussian beam can cause severe melted-resolidified layers around the hole, yet Bessel beam only resulted in thin ribbon around the hole. The picosecond Bessel laser is more suitable than femtosecond laser for ablating holes on ZnS. The radius of the holes increases with increasing the Bessel beam pulse width and the beam power. But larger power may cause circle grooves around the central holes. Ordered hole array was fabricated on single side of CVD ZnS and antireflection was realized.