Fabrication of chemically tethered binary polymer-brush pattern through two-step surface-initiated atomic-transfer radical polymerization

Feng Zhou; Lei Jiang; Weimin Liu; Qunji Xue

doi:10.1002/marc.200400397

Fabrication of chemically tethered binary polymer-brush pattern through two-step surface-initiated atomic-transfer radical polymerization

Feng Zhou
, Lei Jiang
, Weimin Liu
, Qunji Xue

CAS - Lanzhou Institute of Chemical Physics
CAS - Institute of Chemistry

Research output: Contribution to journal › Article › peer-review

67 Scopus citations

Abstract

The communication provides a novel and alternative route to generate chemically tethered binary polymerbrush pattern through two-step surface-initiated atomictransfer radical polymerization (SI-ATRP). Polymer brush-1 was prepared by SI-ATRP, passivated by a reaction with NaN₃, and etched with UV irradiation through a transmission electron microscopy grid to create exposed sites for the subsequently attached initiator on which polymer brush-2 was grown.

Original language	English
Pages (from-to)	1979-1983
Number of pages	5
Journal	Macromolecular Rapid Communications
Volume	25
Issue number	23
DOIs	https://doi.org/10.1002/marc.200400397
State	Published - 12 Dec 2004
Externally published	Yes

Keywords

Atom-transfer radical polymerization (ATRP)
Monolayers
Pattern
Surface-initiated polymerization

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10.1002/marc.200400397

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abstract = "The communication provides a novel and alternative route to generate chemically tethered binary polymerbrush pattern through two-step surface-initiated atomictransfer radical polymerization (SI-ATRP). Polymer brush-1 was prepared by SI-ATRP, passivated by a reaction with NaN3, and etched with UV irradiation through a transmission electron microscopy grid to create exposed sites for the subsequently attached initiator on which polymer brush-2 was grown.",

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AU - Zhou, Feng

AU - Jiang, Lei

AU - Liu, Weimin

AU - Xue, Qunji

PY - 2004/12/12

Y1 - 2004/12/12

N2 - The communication provides a novel and alternative route to generate chemically tethered binary polymerbrush pattern through two-step surface-initiated atomictransfer radical polymerization (SI-ATRP). Polymer brush-1 was prepared by SI-ATRP, passivated by a reaction with NaN3, and etched with UV irradiation through a transmission electron microscopy grid to create exposed sites for the subsequently attached initiator on which polymer brush-2 was grown.

AB - The communication provides a novel and alternative route to generate chemically tethered binary polymerbrush pattern through two-step surface-initiated atomictransfer radical polymerization (SI-ATRP). Polymer brush-1 was prepared by SI-ATRP, passivated by a reaction with NaN3, and etched with UV irradiation through a transmission electron microscopy grid to create exposed sites for the subsequently attached initiator on which polymer brush-2 was grown.

KW - Atom-transfer radical polymerization (ATRP)

KW - Monolayers

KW - Pattern

KW - Surface-initiated polymerization

UR - https://www.scopus.com/pages/publications/10644229223

U2 - 10.1002/marc.200400397

DO - 10.1002/marc.200400397

M3 - 文章

AN - SCOPUS:10644229223

SN - 1022-1336

VL - 25

SP - 1979

EP - 1983

JO - Macromolecular Rapid Communications

JF - Macromolecular Rapid Communications

IS - 23

ER -

Fabrication of chemically tethered binary polymer-brush pattern through two-step surface-initiated atomic-transfer radical polymerization

Abstract

Keywords

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