Skip to main navigation Skip to search Skip to main content

Enhancement of energy storage in epitaxial PbZrO3antiferroelectric films using strain engineering

  • Jun Ge
  • , Denis Remiens
  • , Xianlin Dong
  • , Ying Chen
  • , Jean Costecalde
  • , Feng Gao
  • , Fei Cao
  • , Genshui Wang
  • CAS - Shanghai Institute of Ceramics
  • Université Polytechnique Hauts-de-France

Research output: Contribution to journalArticlepeer-review

109 Scopus citations

Abstract

We demonstrate an approach to enhance the energy storage density W of antiferroelectric film through simple altering a crystallographic orientation of the substrate. We reveal that the antiferroelectric phase stability of PbZrO3can be enhanced for the (110) or (111) SrTiO3substrate orientation, thus suppresses the antiferroelectric-ferroelectric phase transition to higher electric field with ∼120-kV/cm increment. In addition, the polarization values of these films are also favorably increased hence increases W by 5.3-J/cm3at 700-kV/cm. The observed enhancement is found to originate from a high sensitivity of phase transition to mechanical confinements due to the volume expansion at the transition.

Original languageEnglish
Article number112908
JournalApplied Physics Letters
Volume105
Issue number11
DOIs
StatePublished - 15 Sep 2014
Externally publishedYes

Fingerprint

Dive into the research topics of 'Enhancement of energy storage in epitaxial PbZrO3antiferroelectric films using strain engineering'. Together they form a unique fingerprint.

Cite this