Abstract
The electronic structure and optical properties of monoclinic HfO2 (m-HfO2) with the consideration of oxygen vacancy were calculated using the plane-wave ultrasoft pseudopotential method based on the first-principles density functional theory (DFT). The results reveal that a new defect level at the conduction band edge is introduced for the defective m-HfO2, and the 5d states of Hf atoms nearest to the oxygen vacancy make significant contribution to it. Furthermore, the dielectric functions and absorption coefficients of the perfect and defective m-HfO2 were calculated and analyzed by means of the electronic structures, which were related to the defect levels. The calculated absorption coefficient shows that m-HfO2 with oxygen vacancy exhibits an absorption band in the ultraviolet region.
| Original language | English |
|---|---|
| Pages (from-to) | 1576-1580 |
| Number of pages | 5 |
| Journal | Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering |
| Volume | 42 |
| Issue number | 8 |
| State | Published - Aug 2013 |
Keywords
- Electronic structure
- Monoclinic HfO
- Optical property
- Oxygen vacancy
Fingerprint
Dive into the research topics of 'Electronic structure and optical properties of monoclinic HfO2 with oxygen vacancy'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver