Abstract
Different annealing heat treatment processes were performed on Ni-Si hypereutectic composites at the solidification rate of 40 µm/s to eliminate the metastable phase and the best heat treatment process was selected (annealing temperature 1 000 °C, holding time 4 h). The oxidation weight gain and oxide rate, oxide film morphology, and oxidation kinetics of Ni-Si hypereutectic composites were studied. Moreover, the formation mechanism of the oxide film was investigated through a thermodynamic analysis, specifically by calculating the change of Gibbs free energy associated with the oxidation reactions. It is found that the oxide resistance of the Ni-Si hypereutectic composite without metastable phase is better than that of the 67.9% content of the metastable phase. The surface of oxidized film is composed of granular NiO, while the underlying layer of oxidized film is composed of platelet-shaped SiO2 and spinel-like nickel silicate Ni2SiO4. Directionally solidified Ni-Si hypereutectic composites have potential applications in high temperature fields. However, Ni31Si12 metastable phase is inevitably formed due to the non-equilibrium solidification, which makes the overall properties of the material unstable.
| Original language | English |
|---|---|
| Pages (from-to) | 639-649 |
| Number of pages | 11 |
| Journal | Journal Wuhan University of Technology, Materials Science Edition |
| Volume | 41 |
| Issue number | 3 |
| DOIs | |
| State | Published - Jun 2026 |
Keywords
- Ni-Si hypereutectic composite
- annealing heat treatment
- directional solidification
- high temperature oxidation
- metastable phase
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