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Dynamic ultrafast laser spatial tailoring for parallel micromachining of photonic devices in transparent materials

  • C. Mauclair
  • , G. Cheng
  • , N. Huot
  • , E. Audouard
  • , A. Rosenfeld
  • , I. V. Hertel
  • , R. Stoian
  • Laboratoire Hubert Curien, UMR 5516 CNRS, Université de Lyon
  • Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy
  • Free University of Berlin

Research output: Contribution to journalArticlepeer-review

94 Scopus citations

Abstract

Femtosecond laser processing of bulk transparent materials can generate localized positive changes of the refractive index. Thus, by translation of the laser spot, light-guiding structures are achievable in three dimensions. Increasing the number of laser processing spots can consequently reduce the machining effort. In this paper, we report on a procedure of dynamic ultrafast laser beam spatial tailoring for parallel photoinscription of photonic functions. Multispot operation is achieved by spatially modulating the wavefront of the beam with a time-evolutive periodical binary phase mask. The parallel longitudinal writing of multiple waveguides is demonstrated in fused silica. Using this technique, light dividers in three dimensions and wavelength-division demultiplexing (WDD) devices relying on evanescent wave coupling are demonstrated.

Original languageEnglish
Pages (from-to)3531-3542
Number of pages12
JournalOptics Express
Volume17
Issue number5
DOIs
StatePublished - 2 Mar 2009
Externally publishedYes

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