Abstract
Titanium dioxide (TiO2) films have been deposited onto stainless steel substrates using atomic layer deposition (ALD) technique. Composition analysis shows that the films shield the substrates entirely. The TiO2 films are amorphous in structure as characterized by X-ray diffraction. The electrochemical measurements show that the equilibrium corrosion potential positively shifts from - 0.96 eV for bare stainless steel to - 0.63 eV for TiO2 coated stainless steel, and the corrosion current density decreases from 7.0 × 10- 7 A/cm2 to 6.3 × 10- 8 A/cm2. The corrosion resistance obtained by fitting the impedance spectra also reveals that the TiO2 films provide good protection for stainless steel against corrosion in sodium chloride solution. The above results indicate that TiO2 films deposited by ALD are effective in protecting stainless steel from corrosion.
Original language | English |
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Pages (from-to) | 2399-2402 |
Number of pages | 4 |
Journal | Surface and Coatings Technology |
Volume | 202 |
Issue number | 11 |
DOIs | |
State | Published - 25 Feb 2008 |
Externally published | Yes |
Keywords
- Atomic layer deposition
- Corrosion
- Stainless steel
- Titanium dioxide