Corrosion resistance of TiO2 films grown on stainless steel by atomic layer deposition

C. X. Shan, Xianghui Hou, Kwang Leong Choy

Research output: Contribution to journalArticlepeer-review

250 Scopus citations

Abstract

Titanium dioxide (TiO2) films have been deposited onto stainless steel substrates using atomic layer deposition (ALD) technique. Composition analysis shows that the films shield the substrates entirely. The TiO2 films are amorphous in structure as characterized by X-ray diffraction. The electrochemical measurements show that the equilibrium corrosion potential positively shifts from - 0.96 eV for bare stainless steel to - 0.63 eV for TiO2 coated stainless steel, and the corrosion current density decreases from 7.0 × 10- 7 A/cm2 to 6.3 × 10- 8 A/cm2. The corrosion resistance obtained by fitting the impedance spectra also reveals that the TiO2 films provide good protection for stainless steel against corrosion in sodium chloride solution. The above results indicate that TiO2 films deposited by ALD are effective in protecting stainless steel from corrosion.

Original languageEnglish
Pages (from-to)2399-2402
Number of pages4
JournalSurface and Coatings Technology
Volume202
Issue number11
DOIs
StatePublished - 25 Feb 2008
Externally publishedYes

Keywords

  • Atomic layer deposition
  • Corrosion
  • Stainless steel
  • Titanium dioxide

Fingerprint

Dive into the research topics of 'Corrosion resistance of TiO2 films grown on stainless steel by atomic layer deposition'. Together they form a unique fingerprint.

Cite this