Chemical vapor deposition of boron-doped carbon coating from BCl₃-C₃H₆-H₂-Ar gas mixture

Boron-doped carbon coating was deposited from BCUHfHHb-Ar gas mixture by low pressure chemical vapor deposition. The morphologies, compositions and bonding states of deposits were analyzed using scanning electron microscope and X-ray photoelectron spectroscopy. The effects of deposition temperature, C/B ratio in reactants and Ar dilution flow on deposition rate, morphologies, compositions and bonding states were widely discussed. The deposition rate was mainly influenced by deposition temperature and C/B ratio in reactants. The cross-section morphologies changed from glass-like to nano-laminated structure with increasing temperature, C/B ratio and Ar dilution flow. The boron concentrations decreased with increasing temperature, C/B ratio and Ar dilution flow, corresponding with increased carbon concentrations.