Annealing effects on the structural and optical properties of HfO                         2                          thin films deposited by thermal evaporation technique

Shida Li; Xiaoli Liu; Huasong Liu; Lishuan Wang; Yugang Jiang; Peng Shang; Xiao Yang; Dandan Liu; Yiqin Ji

doi:10.1117/12.2506510

Annealing effects on the structural and optical properties of HfO ₂ thin films deposited by thermal evaporation technique

Shida Li
, Xiaoli Liu
, Huasong Liu
, Lishuan Wang
, Yugang Jiang
, Peng Shang
, Xiao Yang
, Dandan Liu
, Yiqin Ji

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

1 Scopus citations

Abstract

Hafnium oxide (HfO ₂ ) thin films has been prepared on glass substrates at room temperature by thermal evaporation technique using HfO ₂ powders (99% purity) and then are annealed at different temperatures ranging from 150° to 450° for 24 hours in air. The effects of the annealing temperatures on the structural and optical properties of the HfO ₂ thin films were studied. Amorphous structures of the HfO ₂ films were researched by XRD technology. The results of the study show that the state of the HfO ₂ film changes from amorphous to polycrystalline with the increase of heat treatment temperature and the the stress is released. Besides, the refractive index of the films decreases and the band energy changes significantly. Therefore, the heat treatment can effectively change the film properties and it is necessary to comprehensively select the optimal heat treatment temperature according to the specific application of the HfO ₂ thin films.

Original language	English
Title of host publication	9th International Symposium on Advanced Optical Manufacturing and Testing Technologies
Subtitle of host publication	Advanced Optical Manufacturing Technologies
Editors	Yongjian Wan, Bin Fan, Xiangang Luo, Mingbo Pu, Xiong Li, William T. Plummer
Publisher	SPIE
ISBN (Electronic)	9781510623187
DOIs	https://doi.org/10.1117/12.2506510
State	Published - 2019
Externally published	Yes
Event	9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, AOMATT 2018 - Chengdu, China Duration: 26 Jun 2018 → 29 Jun 2018

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	10838
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Conference

Conference	9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, AOMATT 2018
Country/Territory	China
City	Chengdu
Period	26/06/18 → 29/06/18

Keywords

Annealing
Band gap
Cody-Lorentz model
HfO film
Optical properties
Structural properties
XRD

Access to Document

10.1117/12.2506510

Cite this

Li, S., Liu, X., Liu, H., Wang, L., Jiang, Y., Shang, P., Yang, X., Liu, D., & Ji, Y. (2019). Annealing effects on the structural and optical properties of HfO ₂ thin films deposited by thermal evaporation technique In Y. Wan, B. Fan, X. Luo, M. Pu, X. Li, & W. T. Plummer (Eds.), 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies Article 108381L (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10838). SPIE. https://doi.org/10.1117/12.2506510

Li, Shida ; Liu, Xiaoli ; Liu, Huasong et al. / Annealing effects on the structural and optical properties of HfO ₂ thin films deposited by thermal evaporation technique 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies. editor / Yongjian Wan ; Bin Fan ; Xiangang Luo ; Mingbo Pu ; Xiong Li ; William T. Plummer. SPIE, 2019. (Proceedings of SPIE - The International Society for Optical Engineering).

@inproceedings{0a1a0151945246359097108857bc02d3,

title = " Annealing effects on the structural and optical properties of HfO 2 thin films deposited by thermal evaporation technique ",

abstract = " Hafnium oxide (HfO 2 ) thin films has been prepared on glass substrates at room temperature by thermal evaporation technique using HfO 2 powders (99\% purity) and then are annealed at different temperatures ranging from 150° to 450° for 24 hours in air. The effects of the annealing temperatures on the structural and optical properties of the HfO 2 thin films were studied. Amorphous structures of the HfO 2 films were researched by XRD technology. The results of the study show that the state of the HfO 2 film changes from amorphous to polycrystalline with the increase of heat treatment temperature and the the stress is released. Besides, the refractive index of the films decreases and the band energy changes significantly. Therefore, the heat treatment can effectively change the film properties and it is necessary to comprehensively select the optimal heat treatment temperature according to the specific application of the HfO 2 thin films.",

keywords = "Annealing, Band gap, Cody-Lorentz model, HfO film, Optical properties, Structural properties, XRD",

author = "Shida Li and Xiaoli Liu and Huasong Liu and Lishuan Wang and Yugang Jiang and Peng Shang and Xiao Yang and Dandan Liu and Yiqin Ji",

note = "Publisher Copyright: {\textcopyright} 2019 COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only.; 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, AOMATT 2018 ; Conference date: 26-06-2018 Through 29-06-2018",

year = "2019",

doi = "10.1117/12.2506510",

language = "英语",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

publisher = "SPIE",

editor = "Yongjian Wan and Bin Fan and Xiangang Luo and Mingbo Pu and Xiong Li and Plummer, \{William T.\}",

booktitle = "9th International Symposium on Advanced Optical Manufacturing and Testing Technologies",

}

Li, S, Liu, X, Liu, H, Wang, L, Jiang, Y, Shang, P, Yang, X, Liu, D & Ji, Y 2019, Annealing effects on the structural and optical properties of HfO ₂ thin films deposited by thermal evaporation technique in Y Wan, B Fan, X Luo, M Pu, X Li & WT Plummer (eds), 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies., 108381L, Proceedings of SPIE - The International Society for Optical Engineering, vol. 10838, SPIE, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, AOMATT 2018, Chengdu, China, 26/06/18. https://doi.org/10.1117/12.2506510

Annealing effects on the structural and optical properties of HfO ₂ thin films deposited by thermal evaporation technique . / Li, Shida; Liu, Xiaoli; Liu, Huasong et al.
9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies. ed. / Yongjian Wan; Bin Fan; Xiangang Luo; Mingbo Pu; Xiong Li; William T. Plummer. SPIE, 2019. 108381L (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10838).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Annealing effects on the structural and optical properties of HfO 2 thin films deposited by thermal evaporation technique

AU - Li, Shida

AU - Liu, Xiaoli

AU - Liu, Huasong

AU - Wang, Lishuan

AU - Jiang, Yugang

AU - Shang, Peng

AU - Yang, Xiao

AU - Liu, Dandan

AU - Ji, Yiqin

PY - 2019

Y1 - 2019

N2 - Hafnium oxide (HfO 2 ) thin films has been prepared on glass substrates at room temperature by thermal evaporation technique using HfO 2 powders (99% purity) and then are annealed at different temperatures ranging from 150° to 450° for 24 hours in air. The effects of the annealing temperatures on the structural and optical properties of the HfO 2 thin films were studied. Amorphous structures of the HfO 2 films were researched by XRD technology. The results of the study show that the state of the HfO 2 film changes from amorphous to polycrystalline with the increase of heat treatment temperature and the the stress is released. Besides, the refractive index of the films decreases and the band energy changes significantly. Therefore, the heat treatment can effectively change the film properties and it is necessary to comprehensively select the optimal heat treatment temperature according to the specific application of the HfO 2 thin films.

AB - Hafnium oxide (HfO 2 ) thin films has been prepared on glass substrates at room temperature by thermal evaporation technique using HfO 2 powders (99% purity) and then are annealed at different temperatures ranging from 150° to 450° for 24 hours in air. The effects of the annealing temperatures on the structural and optical properties of the HfO 2 thin films were studied. Amorphous structures of the HfO 2 films were researched by XRD technology. The results of the study show that the state of the HfO 2 film changes from amorphous to polycrystalline with the increase of heat treatment temperature and the the stress is released. Besides, the refractive index of the films decreases and the band energy changes significantly. Therefore, the heat treatment can effectively change the film properties and it is necessary to comprehensively select the optimal heat treatment temperature according to the specific application of the HfO 2 thin films.

KW - Annealing

KW - Band gap

KW - Cody-Lorentz model

KW - HfO film

KW - Optical properties

KW - Structural properties

KW - XRD

UR - https://www.scopus.com/pages/publications/85060432957

U2 - 10.1117/12.2506510

DO - 10.1117/12.2506510

M3 - 会议稿件

AN - SCOPUS:85060432957

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies

A2 - Wan, Yongjian

A2 - Fan, Bin

A2 - Luo, Xiangang

A2 - Pu, Mingbo

A2 - Li, Xiong

A2 - Plummer, William T.

PB - SPIE

T2 - 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, AOMATT 2018

Y2 - 26 June 2018 through 29 June 2018

ER -

Li S, Liu X, Liu H, Wang L, Jiang Y, Shang P et al. Annealing effects on the structural and optical properties of HfO ₂ thin films deposited by thermal evaporation technique In Wan Y, Fan B, Luo X, Pu M, Li X, Plummer WT, editors, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies. SPIE. 2019. 108381L. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.2506510