Annealing effects on structural, optical properties and laser-induced damage threshold of MgF2 thin films

Ting Ting Tan; Bang Jie Liu; Zhi Hui Wu; Zheng Tang Liu

doi:10.1007/s40195-016-0479-x

Annealing effects on structural, optical properties and laser-induced damage threshold of MgF₂ thin films

Ting Ting Tan
, Bang Jie Liu
, Zhi Hui Wu
, Zheng Tang Liu

Northwestern Polytechnical University Xian

Research output: Contribution to journal › Article › peer-review

15 Scopus citations

Abstract

The chemical structures, optical properties and laser-induced damage thresholds of magnesium fluoride films annealed at different temperatures were investigated. The results showed that the stoichiometry of MgF₂ film changed a little with the increase in annealing temperature. Analysis of the optical properties indicated that excellent antireflection behavior of the film in the range of 200-400 nm can be obtained by the samples coated with MgF₂ film. The refractive index increased and the extinction coefficient decreased with increasing annealing temperature. Compared with the as-deposited films, the laser-induced damage threshold was improved after annealing process and decreased with the increase in annealing temperature, which was probably due to the denser film and more absorption centers under higher annealing temperature.

Original language	English
Pages (from-to)	73-78
Number of pages	6
Journal	Acta Metallurgica Sinica (English Letters)
Volume	30
Issue number	1
DOIs	https://doi.org/10.1007/s40195-016-0479-x
State	Published - Jan 2017
Externally published	Yes

Keywords

Annealing temperature
Chemical structure
Laser-induced damage threshold (LIDT)
MgF films
Optical properties

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10.1007/s40195-016-0479-x

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title = "Annealing effects on structural, optical properties and laser-induced damage threshold of MgF2 thin films",

abstract = "The chemical structures, optical properties and laser-induced damage thresholds of magnesium fluoride films annealed at different temperatures were investigated. The results showed that the stoichiometry of MgF2 film changed a little with the increase in annealing temperature. Analysis of the optical properties indicated that excellent antireflection behavior of the film in the range of 200-400 nm can be obtained by the samples coated with MgF2 film. The refractive index increased and the extinction coefficient decreased with increasing annealing temperature. Compared with the as-deposited films, the laser-induced damage threshold was improved after annealing process and decreased with the increase in annealing temperature, which was probably due to the denser film and more absorption centers under higher annealing temperature.",

keywords = "Annealing temperature, Chemical structure, Laser-induced damage threshold (LIDT), MgF films, Optical properties",

author = "Tan, \{Ting Ting\} and Liu, \{Bang Jie\} and Wu, \{Zhi Hui\} and Liu, \{Zheng Tang\}",

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AU - Tan, Ting Ting

AU - Liu, Bang Jie

AU - Wu, Zhi Hui

AU - Liu, Zheng Tang

N1 - Publisher Copyright: © The Chinese Society for Metals and Springer-Verlag 2016.

PY - 2017/1

Y1 - 2017/1

N2 - The chemical structures, optical properties and laser-induced damage thresholds of magnesium fluoride films annealed at different temperatures were investigated. The results showed that the stoichiometry of MgF2 film changed a little with the increase in annealing temperature. Analysis of the optical properties indicated that excellent antireflection behavior of the film in the range of 200-400 nm can be obtained by the samples coated with MgF2 film. The refractive index increased and the extinction coefficient decreased with increasing annealing temperature. Compared with the as-deposited films, the laser-induced damage threshold was improved after annealing process and decreased with the increase in annealing temperature, which was probably due to the denser film and more absorption centers under higher annealing temperature.

AB - The chemical structures, optical properties and laser-induced damage thresholds of magnesium fluoride films annealed at different temperatures were investigated. The results showed that the stoichiometry of MgF2 film changed a little with the increase in annealing temperature. Analysis of the optical properties indicated that excellent antireflection behavior of the film in the range of 200-400 nm can be obtained by the samples coated with MgF2 film. The refractive index increased and the extinction coefficient decreased with increasing annealing temperature. Compared with the as-deposited films, the laser-induced damage threshold was improved after annealing process and decreased with the increase in annealing temperature, which was probably due to the denser film and more absorption centers under higher annealing temperature.

KW - Annealing temperature

KW - Chemical structure

KW - Laser-induced damage threshold (LIDT)

KW - MgF films

KW - Optical properties

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DO - 10.1007/s40195-016-0479-x

M3 - 文章

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Annealing effects on structural, optical properties and laser-induced damage threshold of MgF₂ thin films

Abstract

Keywords

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