Abstract
Amorphous boron carbide was prepared by chemical vapor deposition from BCI3-CH4-H2 system. The deposits were characterized by SEM, EDS, XRD, FTIR, Raman, and XPS. The results showed that deposition indicate cauliflower-like surface and glass-like cross-sectional morphologies. The boron concentration is 42.83at%, corresponding with 56.32at% carbon and 0.75af% oxygen by EDS. The XRD was not suitable to characterize amorphous boron carbide. B-C bond state was demonstrated by Raman, FTTR and XPS spectrum. Amorphous structure was demonstrated by TEM. The formation of intermediate reactant, BxCyHzCl was very important for the deposition of amorphous boron carbide.
Original language | English |
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Title of host publication | High Temperature Ceramic Matrix Composites 8 |
Publisher | wiley |
Pages | 345-355 |
Number of pages | 11 |
ISBN (Electronic) | 9781118932995 |
ISBN (Print) | 9781118932988 |
DOIs | |
State | Published - 1 Jan 2014 |
Keywords
- Boron carbide coatings
- Chemical vapor deposition
- Kinetic modeling
- Mass transfer
- Silicon carbide