Analysis and characterization of amorphous boron carbide coatings deposited from BCI3-CH4-H2 mixtures

Research output: Chapter in Book/Report/Conference proceedingChapterpeer-review

Abstract

Amorphous boron carbide was prepared by chemical vapor deposition from BCI3-CH4-H2 system. The deposits were characterized by SEM, EDS, XRD, FTIR, Raman, and XPS. The results showed that deposition indicate cauliflower-like surface and glass-like cross-sectional morphologies. The boron concentration is 42.83at%, corresponding with 56.32at% carbon and 0.75af% oxygen by EDS. The XRD was not suitable to characterize amorphous boron carbide. B-C bond state was demonstrated by Raman, FTTR and XPS spectrum. Amorphous structure was demonstrated by TEM. The formation of intermediate reactant, BxCyHzCl was very important for the deposition of amorphous boron carbide.

Original languageEnglish
Title of host publicationHigh Temperature Ceramic Matrix Composites 8
Publisherwiley
Pages345-355
Number of pages11
ISBN (Electronic)9781118932995
ISBN (Print)9781118932988
DOIs
StatePublished - 1 Jan 2014

Keywords

  • Boron carbide coatings
  • Chemical vapor deposition
  • Kinetic modeling
  • Mass transfer
  • Silicon carbide

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