Ablation behaviors and mechanisms of Cf/HfCPIP-SiCCVI composites: From SiO2 nanowires film to HfO2 skeleton

Wanbo Hou, Tao Feng, Xiangyuan Meng, Xinhao Shi, Mingde Tong, Hejun Li, Hongjiao Lin

Research output: Contribution to journalArticlepeer-review

15 Scopus citations

Abstract

The ablation resistance of Cf/HfCPIP-SiCCVI composites was tested under an oxyacetylene flame. After ablation, many SiO2 nanowires were in-situ grown in the edge region. From the edge region to the transition region, the melting behaviors of SiO2 nanowires was gradually intensified, and finally, they completely transformed into SiO2 glass. At the border of the central region and the transition region, the HfO2 grains were gradually precipitated from the SiO2 glass and formed a tubular structure. By comparing the ablation behaviors at different temperatures and times, the ablation mechanisms of Cf/HfCPIP-SiCCVI composites was investigated systematically.

Original languageEnglish
Article number110766
JournalCorrosion Science
Volume209
DOIs
StatePublished - Dec 2022

Keywords

  • Ablation behaviors
  • Ablation mechanisms
  • HfO skeleton
  • Melting behaviors
  • SiO nanowires

Fingerprint

Dive into the research topics of 'Ablation behaviors and mechanisms of Cf/HfCPIP-SiCCVI composites: From SiO2 nanowires film to HfO2 skeleton'. Together they form a unique fingerprint.

Cite this