A Novel Design Method for a Miniaturized Vertical Interconnection TSV Structure

  • Yihao Xia
  • , Qingyu Kong
  • , Zeyuan Chen
  • , Zhongpeng Liu
  • , Yanhong Gao
  • , Dongbo Chen
  • , Shigang Zhou
  • , Xilong Lu

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

This paper presents the RF TSV transmission structure with a diameter of 500 micrometers. Through simulation and optimization, a miniaturized vertically interconnected TSV structure is finally designed. Experiments and simulation results confirm the effectiveness and potential application prospects of the new structure. The novel TSV structure presented in this study demonstrates significant potential for enhancing transmission efficiency and reducing occupied space, promising widespread adoption in various advanced technological applications.

Original languageEnglish
Title of host publication2024 IEEE 7th International Conference on Electronic Information and Communication Technology, ICEICT 2024
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages446-448
Number of pages3
ISBN (Electronic)9798350384437
DOIs
StatePublished - 2024
Event7th IEEE International Conference on Electronic Information and Communication Technology, ICEICT 2024 - Xi'an, China
Duration: 31 Jul 20242 Aug 2024

Publication series

Name2024 IEEE 7th International Conference on Electronic Information and Communication Technology, ICEICT 2024

Conference

Conference7th IEEE International Conference on Electronic Information and Communication Technology, ICEICT 2024
Country/TerritoryChina
CityXi'an
Period31/07/242/08/24

Keywords

  • miniaturization and high integration
  • RF
  • Through-Silicon Via (TSV)

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