Abstract
Two new unimolecular azocarbazole-based visible photobase generators (Ac-C-Base) with different strong bases such as 1,5,7-triazabicyclo[4.4.0]dec-5-ene (TBD) and 1,1,3,3-tetramethylguanidine (TMG) as the potential active species were prepared. Their structures were confirmed by 1H NMR, 13C NMR, and HR-MS. According to the photolysis and EPR results, Ac-C-Base could generate free radicals and strong bases simultaneously through the photodecarboxylation mechanism under 455 nm LED irradiation. Thus they can effectively catalyze the thiol-epoxy polymerization without post exposure baking under light exposure. In addition, the Ac-C-TBD containing a stronger base shows a faster polymerization rate and higher epoxy conversion.
| Original language | English |
|---|---|
| Pages (from-to) | 3020-3028 |
| Number of pages | 9 |
| Journal | Journal of Polymer Science |
| Volume | 59 |
| Issue number | 23 |
| DOIs | |
| State | Published - 1 Dec 2021 |
| Externally published | Yes |
Keywords
- azocarbazole
- photobase generators
- thiol-epoxy photopolymerization
- visible light
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