The Deposition of Isolated Fe(3+) Species in Mesoporous Silicon for Oxidation of Cyclohexane

Liming Zhai, Bin Zhang, Haitao Li, Min Jiang, Xinchun Yang, Zhuo Li, Shichao Zhao, Yong Qin

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

The balance of activity and selectivity in liquid alkane oxidation is challenging for the design of supported Fe catalysts. When Fe species leach to the solvent, uncontrolled free radical chain reactions happen. Herein, isolated Fe(3+) species were constructed by forming a strong Fe−O−Si bond for the selective oxidation of cyclohexane to cyclohexanone by H2O2. Compared to the supported FeOx clusters, the strong Fe−O−Si bond between isolated Fe(3+) species and SiO2 prevents the leaching of Fe in strong oxidation (H2O2) reaction conditions and dominates the non-free radical mechanism. The turnover frequency over 10FeOx/SBA-15 reached 15.2 h−1, higher than for reported Fe-based catalysts. High selectivity of cyclohexanone is maintained at different conversions. Moreover, the (SiO)xFe3+(OH)3-x−OOH active species were detected by Raman and FTIR and are generated from the oxidation of isolated Fe species. The strong Fe−O−Si bond and non-free-radical mechanism by (SiO)xFe3+(OH)3-x−OOH active species induce high activity and selectivity for the oxidation of many other alkanes.

Original languageEnglish
Article numbere202300887
JournalChemCatChem
Volume15
Issue number23
DOIs
StatePublished - 7 Dec 2023
Externally publishedYes

Keywords

  • atomic layer deposition
  • cyclohexane oxidation
  • Fe−O−Si bond
  • isolated Fe(3+) species
  • selective cyclohexane oxidation

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